Covalent Patterning of 2D MoS 2
نویسندگان
چکیده
An efficient approach to patterning 2D MoS2 through covalent functionalization of electron beam lithography (EBL)-defined guiding patterns has been demonstrated by A. Hirsch et al. in their Communication (DOI: 10.1002/chem.202102021). This opens a convenient avenue for spatially designing and engineering nanostructures, would benefit further exploration MoS2-based devices facilitate manufacture.
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ژورنال
عنوان ژورنال: Chemistry: A European Journal
سال: 2021
ISSN: ['0947-6539', '1521-3765']
DOI: https://doi.org/10.1002/chem.202102909